Alloy Sputter Targets

List of our alloy sputter targets

Product	Purity	Catalog No.	Typical Lead Time
Aluminum Copper (Al/Cu) Sputtering Targets	99.99%	DPMA13ST	4 Weeks
Zinc Tin (Zn/Sn) Sputtering Targets	99.99%	DPMA30ST	4 Weeks
Cobalt Aluminum (Co/Al) Sputtering Targets	99.9%	DPMA27ST	4 Weeks
Copper Gallium (Cu/Ga) Sputtering Targets	99.9%	DPMA29ST	4 Weeks
Copper Germanium (Cu/Ge) Sputtering Targets	99.9%	DPMA29ST	4 Weeks
Copper Indium (Cu/In) Sputtering Targets	99.9%	DPMA29ST	4 Weeks
Nickel Chromium (Ni/Cr 80/20) Sputtering Targets	99.9%	DPMA28ST	4 Weeks
Nickel Iron (Ni/Fe) Sputtering Targets	99.9%	DPMA26ST	4 Weeks
Cobalt Iron (Co/Fe) Sputtering Targets	99.9% ~ 99.95%	DPMA27ST	4 Weeks
Copper Indium Gallium (Cu/In/Ga) Sputtering Targets	99.9% ~ 99.95%	DPMA29ST	4 Weeks
Molybdenum Chromium (Mo/Cr) Sputtering Targets	99.9% ~ 99.95%	DPMA42ST	4 Weeks
Molybdenum Niobium (Mo/Nb) Sputtering Targets	99.9% ~ 99.95%	DPMA42ST	4 Weeks
Molybdenum Titanium (Mo/Ti) Sputtering Targets	99.9% ~ 99.95%	DPMA42ST	4 Weeks
Tungsten Titanium (W/Ti) Sputtering Targets	99.9% ~ 99.95%	DPMA74ST	4 Weeks
Cobalt Iron Boron (Co/Fe/B) Sputtering Targets	99.5% ~ 99.9%	DPMA BO27ST	4 Weeks
Aluminum Copper Silicon (AlSiCu) Sputtering Target	99.9%	DPSI1329ST	4 Weeks
Aluminum Silicon (AlSi) Sputtering Target	99.9%	DPSI13ST	4 Weeks
Chromium Silicide (CrSi2) Sputtering Target	99.9%	DPSI24ST2	4 Weeks
Chromium Silicon (CrSi) Sputtering Target	99.9%	DPSI24ST	4 Weeks
Iron Silicide (FeSi2) Sputtering Target	99.9%	DPSI26ST	4 Weeks
Molybdenum Silicide (MoSi) Sputtering Target	99.9%	DPSI42ST	4 Weeks
Molybdenum Silicide (MoSi2) Sputtering Target	99.9%	DPSI42ST2	4 Weeks
Molybdenum Titanium (MoTi) Sputtering Target	99.9%	DPAM4222ST	4 Weeks
Niobium Silicide (NbSi2) Sputtering Target	99.9%	DPSI41ST	4 Weeks
Zirconium Silicide (ZrSi2) Sputtering Target	99.9%	DPSI40ST	4 Weeks
Copper Tungsten(Cu-W) sputter target	99.9%	RF7429-ST	4 Weeks

About Sputter Targets

Sputter targets serve as the source material in physical vapor deposition techniques like sputter deposition. Specifically, these targets come in a wide variety of compositions and sizes tailored for different applications. Common target materials include metals, metal alloys, metalloids, and nonmetals. Often taking on a disc-like shape, targets have diameters ranging from 2-12 inches and thicknesses from 1/8 to 2 inches. Moreover, the target's composition and purity are strictly controlled to ensure consistent and reproducible thin film deposition.

During sputter deposition, the sputter target is placed opposite the substrate, such as a silicon wafer, inside a vacuum chamber. Consequently, an electric current applied to the target causes surface atoms to eject through momentum transfer from ionized gas plasma particles. These ejected atoms then condense as a thin film on the substrate. Likewise, by regulating process parameters like gas composition, pressure, voltage, and deposition time, thin films with precisely defined properties can be obtained by sputtering from the target. Therefore, sputter targets critically function as the reproducible source material in physical vapor deposition by supplying the deposited film atoms.

QSAM's alloy sputter target

QS Advanced Materials is a supplier of sputter targets tailored for research and development. As an R&D focused company, we understand the evolving needs of scientists and engineers. With our VIM furnaces and hot presser, we have the capability to precisely fabricate flat, disc-shaped alloy sputter targets in a wide array of compositions. Whether you require common metals or exotic multi element compositions, our capability enables synthesis of targets from 1 inch diameter to 18 inches. At QS Advanced Materials, you will find a pleasant environment to source sputter targets with custom designed compositions. We strive to be a premier destination for researchers to obtain high-quality, customized sputter targets.

Sputter targets with other compositions

Composition	Description
Oxide/mixed oxide	Targets made by oxide compounds and mixed oxides such as titanates.
Carbides	List of carbide sputter targets
Nitride	Sputter targets manufactured from nitride compounds
Sulfides	Sputter targets with sulfide compounds
Selenides	Targets made by compounds with selenium
Tellurides	Targets with tellurium related compounds
Rare Earth	Sputter targets made with rare earth metal and compounds

Alloy putter targets packaging

Alloys are packed with plastic bag, vacuum seal,with COA of the raw material. To prevent breaking, we use heavy foam and over sized crates.

Related Product

Sputter Targets with single element

Antimony Selenide (Sb2Se3) Sputtering Targets

Copper Zinc Telluride (CuZnTe, CZT) Sputtering Targets