Bismuth Ferrite (BiFeO3) Sputtering Targets
Composition: Bismuth Ferrite (BiFeO3)
Catalog No.DPOX83ST
Purity:99.9%Please click 
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- Product Details
Bismuth Ferrite (BiFeO3) sputtering target specifications
Formula: BiFeO3
CAS No.:N.A.
Max. dia. of flat disc sputter target: 6"
Typical lead time of BiFeO3 sputtering target:5 weeks
Regular Dimensions and Price of Bismuth Ferrite (BiFeO3) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Bismuth Ferrite sputtering target | $674 | Add to Chart |
| 3"diax 1/8"t Bismuth Ferrite sputtering target | $869 | Add to Chart |
| 2"diax 1/8"t BiFeO3 sputtering target with In bonding to Cu bck plt | $754 | Add to Chart |
| 3"diax 1/8"t BiFeO3 sputtering target with In bonding to Cu bck plt | $1,004 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Mixed oxides sputter targets
Sputtering Bismuth Ferrite
Sputtering technique are frequently used to create a thin film of Bismuth Ferrite . The BiFeO3 target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Bismuth Ferrite in this case, to create athin film of BiFeO3 on the surface of the substrate.
Bismuth Ferrite Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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