Deposition Materials
Physcial vapor deposition (PVD) technology is a widely used method for depositing thin layers of materials onto various substrates. It involves the application of deposition materials onto a target surface using techniques such as sputtering and evaporation. These techniques utilize specialized materials known as sputtering targets and evaporation materials.
Sputtering targets are solid materials that are bombarded with high-energy ions to dislodge atoms or molecules from their surface. These dislodged particles then deposit onto the substrate, forming a thin film. Sputtering targets are available in various compositions to meet specific deposition requirements.
QS Advanced Materials is a professional supplier of sputtering targets and evaporation materials made from rare and customized materials, especially rare earth, ceramics, composite oxides, special alloys and high purity materials.
More information about sputter targets
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Thulium (Tm) Sputtering Targets
Composition:Thulium (Tm)
Catalog No.:DPME69ST
Purity:99.9%(REM)
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for discount and other size
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Rhenium (Re) Sputtering Targets
Composition: Rhenium
Catalog No.:DPMA75ST
Purity:99.99%
Maximum Diameter:8"
Typical Lead Time:2 weeks
Click here for the SDS document of Rhenium disc sputter target
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Aluminium Nitride (AlN) Disc Sputtering Targets
Composition: Aluminium Nitride (AlN)
Catalog No.:DPND13ST
Purity:99.9%
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Titanium Nitride (TiN) Sputtering Targets
Composition:Titanium Nitride (TiN)
Catalog No.:DPND22ST
Purity:99.50%
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Vanadium Dioxide (VO2) Sputtering Target
Composition:Vanadium(IV) Dioxide (VO2)
Catalog No.:DPOX23ST2
Purity:99.99%
Maximum Diameter:10"
Typical Lead Time:4 weeks
Ref. Price:$565 (2" Dia. x 1/8")
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Chromium Nitride (CrN) Sputtering Targets
Composition:Chromium Nitride (CrN)
Catalog No.:DPND24ST
Purity:99.5% ~ 99.9%
Typical Lead Time:4 weeks
Ref. Price:$456.4 (2" Dia. x 1/8")
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Tantalum Nitride (TaN) Sputtering Targets
Composition:Tantalum Nitride (TaN)
Catalog No.:DPND73ST
Purity:99.50%
Typical Lead Time:4 weeks
Ref. Price:$790 (2" Dia. x 1/8")
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Silicon Carbide (SiC) Sputtering Targets
Composition:Silicon Carbide (SiC)
Catalog No.:DPCB14ST
Purity:99.50%
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Scandium (Sc) Sputtering Targets
Catalog No.:DPME21ST
Purity:99.5-99.9%% (Sc/TREM 99.9%-99.99%)
Click here for the specifications of Sc sputter target
Click here for the SDS of scandium sputter target
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Neodymium Oxide (Nd2O3) Sputtering Targets
Composition:Neodymium Oxide (Nd2O3)
Catalog No.:DPOX60ST
Purity:99.9% ~ 99.99% (REO)
Maximum Diameter:18"
Typical Lead Time:3 weeks
Ref. Price:$500 (2" Dia. x 1/8")
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Sputter Targets S~Z
QS Advanced Materials Inc is a professional supplier of sputtering targets. Our sputtering targets production line including
Hot Press(ceramic sputtering targets. e.g. Y2O3 ITO sputter targets),
VIM(metal sputtering targets, e.g. Sc, Gd sputter targets)
Wire Cut(routinely made sputtering targets. e.g.Resputter targets)