Germanium (Ge) Sputtering Targets
Composition: Germanium
Catalog No.DPME32ST
Purity:99.9% ~ 99.9999%Please click 
for discount and other size
- Product Details
Germanium (Ge) sputtering target specifications
Formula: Ge
CAS No.: 14687-40-2
Max. dia. of flat disc sputter target: 18"
Typical lead time of Ge sputtering target:2 weeks
Regular Dimensions and Price of Germanium (Ge) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Germanium sputtering target | $636.5 | Add to Chart |
| 3"diax 1/8"t Germanium sputtering target | $1700 | Add to Chart |
| 2"diax 1/8"t Ge sputtering target with In bonding to Cu bck plt | $717 | Add to Chart |
| 3"diax 1/8"t Ge sputtering target with In bonding to Cu bck plt | $1,835 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Single Element sputter targets
About Germanium
Germanium (Ge) is a semiconductor material widely used in the electronics industry. It has excellent charge carrier mobility and is used in transistors, diodes, and infrared optics. Germanium is also integral in the production of fiber optic systems and solar cells. Thin films of germanium can be deposited using chemical vapor deposition (CVD) and sputtering techniques for various electronic and photonic applications.;
Germanium Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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