GZO (ZnO/Ga2O3) Sputtering Targets

GZO (ZnO/Ga2O3) sputtering target specifications

Formula: ZnO/Ga2O3

CAS No.:1314-13-2

Max. dia. of flat disc sputter target: 18"

Typical lead time of ZnO/Ga2O3 sputtering target:3 weeks

Regular Dimensions and Price of GZO (ZnO/Ga2O3) Sputtering Target

Product Name	Reference Price
2"diax 1/8"t GZO sputtering target	$396	Add to Chart
3"diax 1/8"t GZO sputtering target	$739	Add to Chart
2"diax 1/8"t ZnO/Ga2O3 sputtering target with In bonding to Cu bck plt	$476	Add to Chart
3"diax 1/8"t ZnO/Ga2O3 sputtering target with In bonding to Cu bck plt	$874	Add to Chart

About Our Sputtering Target

QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets

About GZO

The combination of Zinc Oxide (ZnO) and Gallium Oxide (Ga2O3) results in a heterostructure with enhanced electronic and optical properties, useful in ultraviolet photodetectors, power electronics, and transparent conductive oxides. ZnO provides high electron mobility and ultraviolet emission, while Ga2O3 offers a wide bandgap and high breakdown voltage. Thin films of ZnO/Ga2O3 can be deposited using sputtering techniques to create efficient devices for high-voltage applications and UV detection.;

GZO Sputtering Target Packaging

QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

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