Hafnium Boride (HfB2) Sputtering Targets
Composition: Hafnium Boride (HfB2)
Catalog No.DPBO72ST
Purity:99.5%Please click 
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- Product Details
Hafnium Boride (HfB2) sputtering target specifications
Formula: HfB2
CAS No.: 12007-23-7
Max. dia. of flat disc sputter target: 8"
Typical lead time of HfB2 sputtering target:4 weeks
Regular Dimensions and Price of Hafnium Boride (HfB2) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Hafnium Boride sputtering target | $2,301 | Add to Chart |
| 3"diax 1/8"t Hafnium Boride sputtering target | $2200 | Add to Chart |
| 2"diax 1/8"t HfB2 sputtering target with In bonding to Cu bck plt | $2,381 | Add to Chart |
| 3"diax 1/8"t HfB2 sputtering target with In bonding to Cu bck plt | $2,335 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Borides sputter targets
About Hafnium Boride
Hafnium Diboride (HfB2) is a ceramic material with exceptional hardness, high melting point, and good electrical conductivity. It is used in ultra-high temperature ceramics and protective coatings for aerospace applications. Sputtering can be employed to deposit thin films of HfB2 for advanced thermal protection systems and wear-resistant coatings.;
Hafnium Boride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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