Hafnium Fluoride (HfF4) Sputtering Targets
Composition: Hafnium Fluoride (HfF4)
Catalog No.DPHL72ST
Purity:99.9%Please click for discount and other size
- Product Details
Hafnium Fluoride (HfF4) sputtering target specifications
Formula: HfF4
CAS No.: 13709-52-9
Max. dia. of flat disc sputter target: 12"
Typical lead time of HfF4 sputtering target:4 weeks
Regular Dimensions and Price of Hafnium Fluoride (HfF4) Sputtering Target
Product Name | Reference Price | |
2"diax 1/8"t Hafnium Fluoride sputtering target | $1,984 | Add to Chart |
3"diax 1/8"t Hafnium Fluoride sputtering target | $2900 | Add to Chart |
2"diax 1/8"t HfF4 sputtering target with In bonding to Cu bck plt | $2,064 | Add to Chart |
3"diax 1/8"t HfF4 sputtering target with In bonding to Cu bck plt | $3,035 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Fluorides sputter targets
About Hafnium Fluoride
Hafnium Tetrafluoride (HfF4) is used primarily in optical coatings due to its transparency in the infrared spectrum and stability. It is employed in the fabrication of lenses and other optical components. Sputtering can be used to deposit thin films of HfF4, enhancing the optical properties of components in infrared and laser systems.;
Hafnium Fluoride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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