Hafnium (Hf) Sputtering Targets
Composition: Hafnium
Catalog No.DPME72ST
Purity:99.95%Please click 
for discount and other size
- Product Details
Hafnium (Hf) sputtering target specifications
Formula: Hf
CAS No.: 7440-58-6
Max. dia. of flat disc sputter target: 18"
Typical lead time of Hf sputtering target:2 weeks
Regular Dimensions and Price of Hafnium (Hf) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Hafnium sputtering target | $766.5 | Add to Chart |
| 3"diax 1/8"t Hafnium sputtering target | P.O.R. | Add to Chart |
| 2"diax 1/8"t Hf sputtering target with In bonding to Cu bck plt | $847 | Add to Chart |
| 3"diax 1/8"t Hf sputtering target with In bonding to Cu bck plt | P.O.R. | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Single Element sputter targets
About Hafnium
Hafnium is a transition metal with high melting point and excellent corrosion resistance, used in semiconductor manufacturing, particularly in the production of high-k dielectrics. Hafnium-based compounds improve the performance of transistors and capacitors by reducing power consumption and leakage currents. Thin films of hafnium and its compounds can be deposited using sputtering and atomic layer deposition (ALD) methods.;
Hafnium Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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