Hafnium Oxide (HfO2) Sputtering Targets
Composition: Hafnium Oxide (HfO2)
Catalog No.DPOX72ST
Purity:99.9% ~ 99.99%Please click 
for discount and other size
- Product Details
Hafnium Oxide (HfO2) sputtering target specifications
Formula: HfO2
CAS No.:12055-23-1
Max. dia. of flat disc sputter target: 18"
Typical lead time of HfO2 sputtering target:3 weeks
Regular Dimensions and Price of Hafnium Oxide (HfO2) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Hafnium Oxide sputtering target | $595 | Add to Chart |
| 3"diax 1/8"t Hafnium Oxide sputtering target | $1000 | Add to Chart |
| 2"diax 1/8"t HfO2 sputtering target with In bonding to Cu bck plt | $675 | Add to Chart |
| 3"diax 1/8"t HfO2 sputtering target with In bonding to Cu bck plt | $1,135 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
About Hafnium Oxide
Hafnium Dioxide (HfO2) is a high-k dielectric material widely used in semiconductor devices to improve the performance of transistors and capacitors. It helps reduce power consumption and increase device scaling. Thin films of HfO2 are typically deposited using atomic layer deposition (ALD) or sputtering, enabling the production of high-performance electronic components.;
Hafnium Oxide Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
Related Product