High Purity Materials
QS Advnaced Materials use a lot high purity materials to make our products. Some of these materials are also suitable as a product themselves. These includes zirconium and hafnium crystal bar, Electrolyte Iron (Fe), Distilled rare earth metal, and semicon grade boron, etc.
Crystal Bars
Zirconium and hafnium are two closely related elements that share similar properties and crystal structures. Both elements belong to the same group in the periodic table, known as the "titanium group". A crystal bar of Zirconium or Hafnium refers to a high-purity Zr or Hf metal produced using the iodide crystallization method. In the manufacturing process, the raw materials of Zr or Hf are chemically reacted to form zirconium iodide or hafnium iodide. Due to the relatively low boiling point of iodides, they can be evaporated in a vacuum environment without too much heat. Subsequently, the iodides are heated to high temperatures in a reaction vessel and then decompose and depositing onto a master wire due to the higher temperature of master wire. For Zirconium crystal bars, a Zr wire is used as the master wire, while for Hafnium crystal bars, an Hf wire is used. This crystallization method yields polycrystalline metallic rods, hence the name "crystal bar." The evaporative recrystallization process significantly improves the purity of the metal, typically achieving levels of 99.95% or even higher.
Semicon Grade Boron
As a lightweight element, boron is not inherently expensive. However, in order to meet the requirements of the semiconductor industry, high-purity boron with a purity level exceeding 99.99% is necessary. QSAM, in collaboration with its partners, has obtained a supply of high-purity boron to cater to the needs of research institutions, addressing the demand for large-scale experiments. Additionally, QSAM can provide assistance for large-scale production, ensuring a reliable source of high-purity boron.
Distilled Rare Earth Metal
Rare earth metal distillation purification is a process used to separate and purify rare earth metals. It involves heating the mixed rare earth metals to their respective boiling points and then condensing and collecting the vaporized metals. Tantalum condensers are commonly used due to their excellent resistance to corrosion and high melting point. They efficiently cool and condense the vaporized rare earth metals, allowing for their collection. Tungsten crucibles are utilized to contain the rare earth metal raw material during distillation. This distillation process enables the production of high-purity rare earth metals for various industrial applications.
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Samarium Fluoride (SmF3) Sputtering Targets
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Purity:99.9% ~ 99.95%(REM)Please click for discount and other size
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Cerium Fluoride (CeF3) Sputtering Targets
Composition: Cerium Fluoride (CeF3)
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Purity:99.9% ~ 99.99%(REM)Please click for discount and other size
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Yttrium Fluoride (YF3) Sputtering Targets
Composition: Yttrium Fluoride (YF3)
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Purity:99.9% ~ 99.99%(REM)Please click for discount and other size
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Aluminum Fluoride (AlF3) Sputtering Targets
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Purity:99.9% ~ 99.99%Please click for discount and other size
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Barium Fluoride (BaF2) Sputtering Targets
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Purity:99.9% ~ 99.99%Please click for discount and other size
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Chromium Fluoride (CrF3) Sputtering Targets
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Purity:99.9%Please click for discount and other size
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Hafnium Fluoride (HfF4) Sputtering Targets
Composition: Hafnium Fluoride (HfF4)
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Purity:99.9%Please click for discount and other size
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Lithium Fluoride (LiF) Sputtering Targets
Composition: Lithium Fluoride (LiF)
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Purity:99.9% ~ 99.99%Please click for discount and other size
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Manganese Fluoride (MnF2) Sputtering Targets
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Purity:99.9%Please click for discount and other size
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Gadolinium Boride (GdB6) Sputtering Targets
Composition: Gadolinium Boride (GdB6)
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Purity:99.5%Please click for discount and other size
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Samarium Boride (SmB6) Sputtering Targets
Composition: Samarium Boride (SmB6)
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Purity:99.5%Please click for discount and other size
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Boron Carbide (B4C) Sputtering Targets
Composition: Boron Carbide (B4C)
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Purity:99.5%Please click for discount and other size
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Chromium Carbide (Cr3C2) Sputtering Targets
Composition: Chromium Carbide (Cr3C2)
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Hafnium Carbide (HfC) Sputtering Targets
Composition: Hafnium Carbide (HfC)
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Purity:99.5%Please click for discount and other size
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Iron Carbide (Fe3C) Sputtering Targets
Composition: Iron Carbide (Fe3C)
Catalog No.DPCB26ST
Purity:99.5%Please click for discount and other size
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Molybdenum Carbide (Mo2C) Sputtering Targets
Composition: Molybdenum Carbide (Mo2C)
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Purity:99.5%Please click for discount and other size
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Niobium Carbide (NbC) Sputtering Targets
Composition: Niobium Carbide (NbC)
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Purity:99.5%Please click for discount and other size
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Tantalum Carbide (TaC) Sputtering Targets
Composition: Tantalum Carbide (TaC)
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Purity:99.5%Please click for discount and other size
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Titanium Carbide (TiC) Sputtering Targets
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Purity:99.5%Please click for discount and other size