High Purity Materials
QS Advnaced Materials use a lot high purity materials to make our products. Some of these materials are also suitable as a product themselves. These includes zirconium and hafnium crystal bar, Electrolyte Iron (Fe), Distilled rare earth metal, and semicon grade boron, etc.
Crystal Bars
Zirconium and hafnium are two closely related elements that share similar properties and crystal structures. Both elements belong to the same group in the periodic table, known as the "titanium group". A crystal bar of Zirconium or Hafnium refers to a high-purity Zr or Hf metal produced using the iodide crystallization method. In the manufacturing process, the raw materials of Zr or Hf are chemically reacted to form zirconium iodide or hafnium iodide. Due to the relatively low boiling point of iodides, they can be evaporated in a vacuum environment without too much heat. Subsequently, the iodides are heated to high temperatures in a reaction vessel and then decompose and depositing onto a master wire due to the higher temperature of master wire. For Zirconium crystal bars, a Zr wire is used as the master wire, while for Hafnium crystal bars, an Hf wire is used. This crystallization method yields polycrystalline metallic rods, hence the name "crystal bar." The evaporative recrystallization process significantly improves the purity of the metal, typically achieving levels of 99.95% or even higher.
Semicon Grade Boron
As a lightweight element, boron is not inherently expensive. However, in order to meet the requirements of the semiconductor industry, high-purity boron with a purity level exceeding 99.99% is necessary. QSAM, in collaboration with its partners, has obtained a supply of high-purity boron to cater to the needs of research institutions, addressing the demand for large-scale experiments. Additionally, QSAM can provide assistance for large-scale production, ensuring a reliable source of high-purity boron.
Distilled Rare Earth Metal
Rare earth metal distillation purification is a process used to separate and purify rare earth metals. It involves heating the mixed rare earth metals to their respective boiling points and then condensing and collecting the vaporized metals. Tantalum condensers are commonly used due to their excellent resistance to corrosion and high melting point. They efficiently cool and condense the vaporized rare earth metals, allowing for their collection. Tungsten crucibles are utilized to contain the rare earth metal raw material during distillation. This distillation process enables the production of high-purity rare earth metals for various industrial applications.
Related Articles
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Cobalt Iron (Co/Fe) Sputtering Targets
Composition: Cobalt and Iron
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Purity:99.9% ~ 99.95%Please click for discount and other size
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Cobalt Iron Boron (Co/Fe/B) Sputtering Targets
Composition: Cobalt, Boron and Iron
Catalog No.DPMA BO27ST
Purity:99.5% ~ 99.9%Please click for discount and other size
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Copper Gallium (Cu/Ga) Sputtering Targets
Composition: Copper and Gallium
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Purity:99.9% ~ 99.99%Please click for discount and other size
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Copper Germanium (Cu/Ge) Sputtering Targets
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Catalog No.DPMA29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Copper Indium (Cu/In) Sputtering Targets
Composition: Copper and Indium
Catalog No.DPMA29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Copper Indium Gallium (Cu/In/Ga) Sputtering Targets
Composition: Copper, Galliumand Indium
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Purity:99.9% ~ 99.95%Please click for discount and other size
Click here for the specifications of Cu/In/Ga sputter target
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Molybdenum Chromium (Mo/Cr) Sputtering Targets
Composition: Molybdenum and Chromium
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Purity:99.9% ~ 99.95%Please click for discount and other size
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Molybdenum Niobium (Mo/Nb) Sputtering Targets
Composition: Molybdenum and Niobium
Catalog No.DPMA42ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Molybdenum Titanium (Mo/Ti) Sputtering Targets
Composition: Molybdenum and Titanium
Catalog No.DPMA42ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Nickel Chromium (Ni/Cr 80/20) Sputtering Targets
Composition: Nickel and Chromium
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Purity:99.9% ~ 99.99%Please click for discount and other size
Click here for the specifications of Ni/Cr 80/20 sputter target
Click here for the SDS document of Ni/Cr 80/20 Sputter Target
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Tungsten Titanium (W/Ti) Sputtering Targets
Composition: Tungsten and Titanium
Catalog No.DPMA74ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Zinc Tin (Zn/Sn) Sputtering Targets
Composition: Zinc and Tin
Catalog No.DPMA30ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Antimony (Sb) Sputtering Targets
Composition: Antimony
Catalog No.DPME51ST
Purity:99.9% ~ 99.99995%Please click for discount and other size
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Bismuth (Bi) Sputtering Targets
Composition: Bismuth
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Purity:99.9% ~ 99.999%Please click for discount and other size
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Boron (B) Sputtering Targets
Composition: Boron
Catalog No.DPME5ST
Purity:99.5%Please click for discount and other size
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Cadmium (Cd) Sputtering Targets
Composition: Cadmium
Catalog No.DPME48ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Chromium (Cr) Sputtering Targets
Composition: Chromium
Catalog No.DPME24ST
Purity:99.5% ~ 99.995%Please click for discount and other size
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Cobalt (Co) Sputtering Targets
Composition: Cobalt
Catalog No.DPME27ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Germanium (Ge) Sputtering Targets
Composition: Germanium
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Purity:99.9% ~ 99.9999%Please click for discount and other size
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Hafnium (Hf) Sputtering Targets
Composition: Hafnium
Catalog No.DPME72ST
Purity:99.95%Please click for discount and other size