Iron Oxide (Fe2O3) Sputtering Targets
Composition: Iron Oxide (Fe2O3)
Catalog No.DPOX26ST
Purity:99.9%Please click 
for discount and other size
- Product Details
Iron Oxide (Fe2O3) sputtering target specifications
Formula: Fe2O3
CAS No.:1332-37-2
Max. dia. of flat disc sputter target: 18"
Typical lead time of Fe2O3 sputtering target:4 weeks
Regular Dimensions and Price of Iron Oxide (Fe2O3) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Iron Oxide sputtering target | $595 | Add to Chart |
| 3"diax 1/8"t Iron Oxide sputtering target | $652 | Add to Chart |
| 2"diax 1/8"t Fe2O3 sputtering target with In bonding to Cu bck plt | $675 | Add to Chart |
| 3"diax 1/8"t Fe2O3 sputtering target with In bonding to Cu bck plt | $787 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
About Iron Oxide
Iron(III) Oxide (Fe2O3), also known as hematite, is used in pigments, coatings, and as a catalyst in chemical processes. In the semiconductor industry, it is explored for its potential in photoelectrochemical cells for water splitting and solar energy conversion. Thin films of Fe2O3 can be deposited using sputtering to create active layers for these energy applications.;
Iron Oxide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
Related Product