Iron Silicide (FeSi2) Sputtering Target
Composition: FeSi2
Catalog No.DPSI26ST
Purity:99.9%
- Product Details
Iron Silicide (FeSi2) sputtering target specifications
Formula: FeSi2
CAS No.: N.A.
Max. dia. of flat disc sputter target: 14"
Typical lead time of FeSi2 sputtering target:4 weeks
Regular Dimensions and Price of Iron Silicide (FeSi2) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Iron Silicide sputtering target | 530 | Add to Chart |
| 3"diax 1/8"t Iron Silicide sputtering target | 670 | Add to Chart |
| 2"diax 1/8"t FeSi2 sputtering target with In bonding to Cu bck plt | $620 | Add to Chart |
| 3"diax 1/8"t FeSi2 sputtering target with In bonding to Cu bck plt | $800 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Alloys sputter targets
About Iron Silicide
Iron Disilicide (FeSi2) is a semiconductor material with potential applications in thermoelectric devices and infrared detectors. It exhibits good electrical conductivity and thermal stability. Thin films of FeSi2 can be deposited using sputtering to create efficient thermoelectric materials and infrared sensing components.;
Iron Silicide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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