Nickel Boride (NiB)Sputtering Targets
Composition: Nickel Boride (NiB)
Catalog No.DPBO28ST
Purity:99.5%Please click 
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- Product Details
Nickel Boride (Ni2B) sputtering target specifications
Formula: Ni2B
CAS No.: 12007-01-1
Max. dia. of flat disc sputter target: 8"
Typical lead time of Ni2B sputtering target:4 weeks
Regular Dimensions and Price of Nickel Boride (Ni2B) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Nickel Boride sputtering target | $714 | Add to Chart |
| 3"diax 1/8"t Nickel Boride sputtering target | $869 | Add to Chart |
| 2"diax 1/8"t Ni2B sputtering target with In bonding to Cu bck plt | $794 | Add to Chart |
| 3"diax 1/8"t Ni2B sputtering target with In bonding to Cu bck plt | $1,004 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Borides sputter targets
About Nickel Boride
Nickel Boride (Ni2B) is a compound used in catalytic applications and as a precursor for producing nickel-boron alloys. In the context of electronics, it is studied for its potential use in catalytic converters and other high-performance materials. Thin films of Ni2B can be deposited using sputtering, enabling its use in advanced catalytic and electronic applications.;
Nickel Boride Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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