Nickel Oxide (NiO) Sputtering Targets
Composition: Nickel Oxide (NiO)
Catalog No.DPOX28ST
Purity:99.9%Please click 
for discount and other size
- Product Details
Nickel Oxide (NiO) sputtering target specifications
Formula: NiO
CAS No.:1313-99-1
Max. dia. of flat disc sputter target: 18"
Typical lead time of NiO sputtering target:4 weeks
Regular Dimensions and Price of Nickel Oxide (NiO) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Nickel Oxide sputtering target | $396 | Add to Chart |
| 3"diax 1/8"t Nickel Oxide sputtering target | $521 | Add to Chart |
| 2"diax 1/8"t NiO sputtering target with In bonding to Cu bck plt | $476 | Add to Chart |
| 3"diax 1/8"t NiO sputtering target with In bonding to Cu bck plt | $656 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
About Nickel Oxide
Nickel Oxide (NiO) is a semiconductor material with applications in batteries, fuel cells, and catalysis. It is also used in electrochromic devices and as a p-type transparent conducting oxide in optoelectronic devices. Thin films of NiO can be deposited using sputtering, enabling their use in energy storage, conversion, and electronic applications.;
Nickel Oxide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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