Silicon Dioxide (SiO2) Sputtering Targets
Composition: Silicon Dioxide (SiO2)
Catalog No.DPOX14ST
Purity:99.9% ~ 99.995%Please click 
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- Product Details
Silicon Dioxide (SiO2) sputtering target specifications
Formula: SiO2
CAS No.:7631-86-9
Max. dia. of flat disc sputter target: 18"
Typical lead time of SiO2 sputtering target:3 weeks
Regular Dimensions and Price of Silicon Dioxide (SiO2) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Silicon Dioxide sputtering target | $210 | Add to Chart |
| 3"diax 1/8"t Silicon Dioxide sputtering target | $360 | Add to Chart |
| 2"diax 1/8"t SiO2 sputtering target with In bonding to Cu bck plt | $290 | Add to Chart |
| 3"diax 1/8"t SiO2 sputtering target with In bonding to Cu bck plt | $495 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
About Silicon Dioxide
Silicon Dioxide (SiO2) is a widely used insulating material in the semiconductor industry, known for its excellent dielectric properties and thermal stability. It is used as a gate oxide in MOSFETs, as an insulator in capacitors, and as a protective layer in various electronic devices. Thin films of SiO2 can be deposited using techniques such as thermal oxidation, CVD, and sputtering, providing high-quality insulating layers for advanced electronic applications.;
Silicon Dioxide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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