Silicon Nitride (Si3N4) Sputtering Targets
Composition: Silicon Nitride (Si3N4)
Catalog No.DPND14ST
Purity:99.5% ~ 99.9%Please click 
for discount and other size
- Product Details
Silicon Nitride (Si3N4) sputtering target specifications
Formula: Si3N4
CAS No.: 12033-89-5
Max. dia. of flat disc sputter target:
Typical lead time of Si3N4 sputtering target:4 weeks
Regular Dimensions and Price of Silicon Nitride (Si3N4) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Silicon Nitride sputtering target | $426 | Add to Chart |
| 3"diax 1/8"t Silicon Nitride sputtering target | $521 | Add to Chart |
| 2"diax 1/8"t Si3N4 sputtering target with In bonding to Cu bck plt | $506 | Add to Chart |
| 3"diax 1/8"t Si3N4 sputtering target with In bonding to Cu bck plt | $656 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Nitride sputter targets
About Silicon Nitride
Silicon Nitride (Si3N4) is a robust, hard ceramic material with excellent thermal and chemical stability. It is used in semiconductor devices as an insulating layer, a passivation layer to protect surfaces, and as a dielectric material in capacitors. Thin films of silicon nitride can be deposited using techniques such as plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD), creating high-quality films for various electronic and protective applications.;
Silicon Nitride Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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