Sputter Targets with single element

List of our single element sputter targets

Product	Purity	Catalog No.	Typical Lead Time
Aluminum Scandium (Al/Sc) Sputtering Targets	99.9%	DPMA13ST	4 Weeks
Antimony (Sb) Sputtering Targets	99.99%	DPME51ST	4 Weeks
Bismuth (Bi) Sputtering Targets	99.99%	DPME83ST	4 Weeks
Boron (B) Sputtering Targets	99.E205%	DPME5ST	4 Weeks
Cadmium (Cd) Sputtering Targets	99.99%	DPME48ST	4 Weeks
Cerium (Ce) Sputtering Targets	99.9%(REM)	DPME58ST	4 Weeks
Chromium (Cr) Sputtering Targets	99.5% ~ 99.995%	DPME24ST	4 Weeks
Cobalt (Co) Sputtering Targets	99.9%	DPME27ST	4 Weeks
Dysprosium (Dy) Sputtering Targets	99.5% ~ 99.9%(REM)	DPME66ST	4 Weeks
Erbium (Er) Sputtering Targets	99.9%(REM)	DPME68ST	4 Weeks
Europium (Eu) Sputtering Targets	99.9%(REM)	DPME63ST	4 Weeks
Gadolinium (Gd) Sputtering Targets	99.9% ~ 99.99%(REM)	DPME64ST	4 Weeks
Hafnium (Hf) Sputtering Targets	99.95%	DPME72ST	4 Weeks
Holmium (Ho) Sputter Target	99.9% ~ 99.99%REM	DPME67ST	4 Weeks
Iron (Fe) Sputtering Targets	99.9%	DPME26ST	4 Weeks
Lanthanum (La) Sputtering Targets	99.5% ~ 99.9%(REM)	DPME57ST	4 Weeks
Lutetium (Lu) Sputtering Targets	99.5% ~ 99.9%(REM)	DPME71ST	4 Weeks
Magnesium (Mg) Sputtering Targets	99.9%	DPME12ST	4 Weeks
Manganese (Mn) Sputtering Targets	99.5% ~ 99.95%	DPME25ST	4 Weeks
Molybdenum (Mo) Sputtering Targets	99.95%	DPME42ST	4 Weeks
Neodymium (Nd) Sputtering Targets	99.9% ~ 99.95%(REM)	DPME60ST	4 Weeks
Nickel (Ni) Sputtering Targets	99.99%	DPME28ST	4 Weeks
Niobium (Nb) Sputtering Targets	99.95%	DPME41ST	4 Weeks
Praseodymium (Pr) Sputtering Targets	99.5% ~ 99.9%(REM)	DPME59ST	4 Weeks
Samarium (Sm) Sputtering Targets	99.9%(REM)	DPME62ST	4 Weeks
Scandium (Sc) Sputtering Targets	99.99% REM	DPME21ST	4 Weeks
Selenium (Se) Sputtering Targets	99.99%	DPMA34ST	4 Weeks
Silicon (Si) (N-type) Sputtering Targets	99.99%	DPMA14ST	4 Weeks
Silicon (Si) (undoped) Sputtering Targets	99.99%	DPMA14ST	4 Weeks
Silicon (Si)(P-type) Sputtering Targets	99.99%	DPMA14ST	4 Weeks
Silver (Ag) Sputtering Targets	99.99%	DPME47ST	4 Weeks
Tantalum (Ta) Sputtering Targets	99.9% ~ 99.95%	DPMA73ST	4 Weeks
Tellurium (Te) Sputtering Targets	99.99%	DPME52ST	4 Weeks
Terbium (Tb) Sputtering Targets	99.9%(REM)	DPME65ST	4 Weeks
Thulium (Tm) Sputtering Targets	99.95% REM	DPME69ST	4 Weeks
Tin (Sn) Sputtering Targets	99.99%	DPME50ST	4 Weeks
Titanium (Ti) Sputtering Targets	99.0% ~ 99.99%	DPME22ST	4 Weeks
Tungsten (W) Sputtering Targets	99.95%	DPMA74ST	4 Weeks
Vanadium (V) Sputtering Targets	99.9%	DPME23ST	4 Weeks
Ytterbium (Yb) Sputtering Targets	99.9%(REM)	DPME70ST	4 Weeks
Yttrium (Y) Sputtering Targets	99.9%REM	DPME39ST	4 Weeks
Zinc (Zn) Sputtering Targets	99.99%	DPMA30ST	4 Weeks
Zirconium (Zr) Sputtering Targets	99.95%	DPME40ST	4 Weeks

About sputter targets

A sputter target is a material used to deposit thin films via physical vapor deposition techniques such as sputter deposition. Sputter targets come in a variety of compositions and sizes depending on the intended application. Common sputter target materials include metals, metal alloys, metalloids and nonmetals. Targets are often disc shaped with diameters ranging from 2-12 inches and thicknesses from 1/8 to 2 inches. The target composition and purity are precisely controlled to ensure consistent and reproducible thin film deposition.

During sputter deposition, a sputter target acts as the source material. It is placed inside a vacuum chamber opposite the substrate, such as a silicon wafer. An electric current is applied to the target, causing its surface atoms to be ejected by momentum transfer from gaseous plasma ions. These ejected atoms then condense as a thin film on the substrate. By controlling process parameters such as gas composition, pressure, voltage and deposition time, thin films with precisely tuned properties can be obtained by sputtering from a target. Sputter targets thus play a critical role in physical vapor deposition by acting as the reproducible source of deposition material.

QSAM's single element sputter target

QS Advanced Materials is a leading global supplier of sputter targets for research and development applications. As a manufacturer, we recognize the needs of scientists and engineers to develop new materials. With our in-house hot pressing facility, we have the capability to produce small-sized sputter targets in a wide variety of compositions. From common metals to rare earth alloys and everything in between, our targets are precisely fabricated to enable exploration of new materials frontiers. At QS Advanced Materials, we are committed to equipping the R&D community with the means to advance innovation. Our high-quality sputter targets make us the premier one-stop shop for target sourcing needs.

Sputter targets with other compositions

Composition	Description
Oxide/mixed oxide	Targets made by oxide compounds and mixed oxides such as titanates.
Carbides	List of carbide sputter targets
Nitride	Sputter targets manufactured from nitride compounds
Sulfides	Sputter targets with sulfide compounds
Selenides	Targets made by compounds with selenium
Tellurides	Targets with tellurium related compounds
Rare Earth	Sputter targets made with rare earth metal and compounds

Sputter targets packaging

Plastic bag, vacuum seal,with COA of the raw material for the sputter target

Related Product

Alloy Sputter Targets

Antimony Selenide (Sb2Se3) Sputtering Targets

Copper Zinc Telluride (CuZnTe, CZT) Sputtering Targets