Tantalum Boride (TaB2) Sputtering Targets
Composition: Tantalum Boride (TaB2)
Catalog No.DPBO73ST
Purity:99.5%Please click 
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- Product Details
Tantalum Boride (TaB2) sputtering target specifications
Formula: TaB2
CAS No.: 12007-35-1
Max. dia. of flat sputter target: 8"
Typical lead time of TaB2 sputtering target:4 weeks
Regular Dimensions and Price of Tantalum Boride (TaB2) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Tantalum Boride sputtering target | 1217 | Add to Chart |
| 3"diax 1/8"t Tantalum Boride sputtering target | 1984 | Add to Chart |
| 2"diax 1/8"t TaB2 sputtering target with In bonding to Cu bck plt | $1352 | Add to Chart |
| 3"diax 1/8"t TaB2 sputtering target with In bonding to Cu bck plt | $2064 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Borides sputter targets
About Tantalum Boride
Tantalum Boride (TaB2) is a hard, refractory ceramic material with high thermal and electrical conductivity. It is used in cutting tools, wear-resistant coatings, and high-temperature structural components. Thin films of TaB2 can be deposited using sputtering, providing hard and conductive coatings for demanding applications.;
Tantalum Boride Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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