Tantalum (Ta) Sputtering Targets
Composition: Tantalum
Catalog No.DPMA73ST
Purity:99.9% ~ 99.95%Please click 
for discount and other size
- Product Details
Tantalum (Ta) sputtering target specifications
Formula: Ta
CAS No.: 7440-25-7
Max. dia. of flat disc sputter target: 18"
Typical lead time of Ta sputtering target:3 weeks
Regular Dimensions and Price of Tantalum (Ta) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Tantalum sputtering target | $515.5 | Add to Chart |
| 3"diax 1/8"t Tantalum sputtering target | $1350 | Add to Chart |
| 2"diax 1/8"t Ta sputtering target with In bonding to Cu bck plt | $596 | Add to Chart |
| 3"diax 1/8"t Ta sputtering target with In bonding to Cu bck plt | $1,485 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Single Element sputter targets
About Tantalum
Tantalum (Ta) is a refractory metal with excellent corrosion resistance and high melting point. It is used in electronic components such as capacitors, high-temperature alloys, and medical implants. In the semiconductor industry, tantalum is used for thin-film resistors and as a diffusion barrier in integrated circuits. Thin films of tantalum can be deposited using sputtering and evaporation techniques, providing reliable and durable layers for various high-performance applications.;
Tantalum Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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