Thulium (Tm) Sputtering Targets

Thulium introduction

is a rare earth element known for its unique properties and diverse applications. With its distinctive magnetic and optical characteristics, thulium finds utility in various fields. Thulium sputtering targets, for instance, are extensively employed in thin film deposition processes for applications such as semiconductor manufacturing, optical coatings, and data storage devices. These sputtering targets provide a reliable and efficient means of depositing thulium films with high purity and uniformity. Thulium is also utilized in the medical field, particularly in laser technologies. Thulium-doped fibers are employed in medical lasers for procedures like tissue ablation, lithotripsy, and dermatology treatments. These lasers take advantage of thulium's specific wavelength absorption, allowing for precise and minimally invasive medical interventions. In addition to these applications, thulium is employed in specialized lighting, ceramics, and as a dopant in glass manufacturing. Its unique properties continue to drive innovation and exploration of novel applications across various industries.

Thulium Sputtering Target Specifications

Formula: Tm

CAS No.: 7440-30-4

Max. dia. of flat disc sputter target: 14" dia

Typical lead time of Tm sputtering target: 2 weeks

Regular Dimensions and Price of Thulium (Tm) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Thulium sputtering target	$610.00	Click to buy
3"dia x 1/8"t Thulium sputtering target	P.O.R.	Add to Chart
2"dia x 1/8"t Tm sputtering target with In bonding to Cu bck plt	P.O.R.	Add to Chart
3"dia x 1/8"t Tm sputtering target with In bonding to Cu bck plt	P.O.R.	Add to Chart

About Our Sputtering Target

 QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our sputter target material and other customized product. 

Sputtering Thulium

Thulium's unique properties, including its electrical conductivity and stability, have led to its exploration in the field of semiconductor thin films. Thulium oxide (Tm2O3) thin films have shown promise in various semiconductor applications. The process of depositing thulium oxide thin films is usually sputtering. In this process, a thulium or Tm2O3 sputtering target is placed in the sputtering chamber as the source material. High-energy ions are used to eject atoms or molecules from the target, then the thulium in the chamber condense onto the substrate surface to form the thin film. This method allows for precise control over film thickness, uniformity, and composition, ensuring consistent performance across the semiconductor device.

Thulium Sputtering Target Packaging

QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

Related Product

Arsenic Telluride (As2Te3) Sputtering Targets

Lithium Manganate (LiMn2O4) Sputtering Targets

Ytterbium Titanate (Yb2TiO5) Sputtering Targets