Zirconium Silicide (ZrSi2) Sputtering Target
Composition: ZrSi2
Catalog No.DPSI40ST
Purity:99.9%
- Product Details
Zirconium Silicide (ZrSi2) sputtering target specifications
Formula: ZrSi2
CAS No.: 264124-92-7
Max. dia. of flat disc sputter target: 12"
Typical lead time of ZrSi2 sputtering target:4 weeks
Regular Dimensions and Price of Zirconium Silicide (ZrSi2) Sputtering Target
| Product Name | Reference Price | |
| 2"diax 1/8"t Zirconium Silicide sputtering target | N.A. | Add to Chart |
| 3"diax 1/8"t Zirconium Silicide sputtering target | N.A. | Add to Chart |
| 2"diax 1/8"t ZrSi2 sputtering target with In bonding to Cu bck plt | N.A. | Add to Chart |
| 3"diax 1/8"t ZrSi2 sputtering target with In bonding to Cu bck plt | N.A. | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Alloys sputter targets
Sputtering Zirconium Silicide
Sputtering technique are frequently used to create a thin film of Zirconium Silicide. The ZrSi2 target material is placed on the electrode in the sputteringchamber. Heavy ion particle or laser are frequently used to ejecting coatingmaterial from the target, made by Zirconium Silicide in this case, to create athin film of ZrSi2 on the surface of the substrate.
Zirconium Silicide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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